Filed: 1/28/2010 Granted: 6/21/2013 1240 days
Filed: 2/25/2010 Granted: 1/23/2015 1793 days
Filed: 2/25/2010 Granted: 7/4/2014 1590 days
Filed: 3/4/2010 Granted: 4/11/2014 1499 days
Filed: 3/4/2010 Granted: 5/23/2014 1541 days
Filed: 3/4/2010 Granted: 8/8/2014 1618 days
Filed: 3/4/2010 Granted: 10/11/2013 1317 days
Filed: 3/4/2010 Granted: 10/2/2015 2038 days
Filed: 3/4/2010 Granted: 4/18/2014 1506 days
Filed: 3/4/2010 Granted: 2/27/2015 1821 days
Filed: 3/4/2010 Granted: 4/17/2015 1870 days
Filed: 3/11/2010 Granted: 2/10/2011 336 days
Filed: 3/18/2010 Granted: 4/18/2014 1492 days
Filed: 4/2/2010 Granted: 11/8/2013 1316 days
Filed: 4/8/2010 Granted: 5/9/2014 1492 days
Filed: 4/22/2010 Granted: 7/15/2016 2276 days
フォトマスク加工及び半導体処理において使用する増感され化学的に増幅されたフォトレジスト
JP2010092058
Google Patents
Filed: 4/22/2010 Granted: 5/18/2012 757 days
Filed: 4/22/2010 Granted: 1/27/2012 645 days
Filed: 4/22/2010 Granted: 5/17/2013 1121 days
Filed: 4/30/2010 Granted: 5/29/2015 1855 days
Filed: 4/30/2010 Granted: 12/12/2014 1687 days